| 摘要 |
<p>PURPOSE:To manufacture the title soft X-ray transfer mask free M from deterioration with time having high chemical resistance hardly affected by heat and temperature by a method wherein a polyimide film and a silicon dioxide film are formed on a smooth surface of a glass substrate and after forming a soft X-ray absorbent pattern, the glass substrate is released from the polyimide film. CONSTITUTION:A thin sheet glass 1 is spinner-coated with a polyimide resin solution and after thermosetting step, a polyimide film 2 and a silicon dioxide film 3 are formed 1mum thick by high-frequency sputtering step. Next, when an Au film 11 is coated with electron beam posiresist PMMA 0.5mum thick to be electron-exposed for development, an electron resist pattern 12 can be formed and then removed using acetone further to form a lift-off pattern 13. Next, the lift-off pattern 13 is plasma-etched away to form a soft X-ray absorbent pattern 5. Next, a quartz made supporting frame 7 is bonded onto the silicon dioxide film 3 surface using an acryl base resin bonding material 6. Finally, the thin sheet glass 1 is slowly released from the polyimide film 2 using a bit of force.</p> |
