| 摘要 |
A monomer composition contains (A) monomers which contain vinyl groups and in which a heteroatom from the group of halogens, nitrogen, oxygen, sulphur or silicium is associated to the vinyl group; and (B) a compound or a mixture of compounds of general formula (II), in which R<4> stands for methyl, ethyl, isopropyl, n-propyl, n-butyl, isobutyl, secondary butyl, tertiary butyl or trimethylsilyl.
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| 申请人 |
BASF AG, 67063 LUDWIGSHAFEN, DE |
发明人 |
SUTORIS, HEINZ FRIEDRICH, DR., 67227 FRANKENTHAL, DE;KOCH, ANDREAS, DR., 67240 BOBENHEIM-ROXHEIM, DE;AUMUELLER, ALEXANDER, DR., 67435 NEUSTADT, DE;DUPUIS, JACQUES, DR., 67069 LUDWIGSHAFEN, DE;NIESSNER, MANFRED, DR., 67105 SCHIFFERSTADT, DE |
