发明名称 METHOD AND APPARATUS FOR MANUFACTURING GAS MIXTURE AND METHOD FOR CALIBRATING GAS ANALYZING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a gas mixture and a method for calibrating a gas analyzing apparatus which can prepare the gas mixture with a volatile component of known concentration used for a calibrating reference or an industrial process in the range of very low concentration on-line. SOLUTION: The apparatus for manufacturing the gas mixture containing at least one gas trace component with the predetermined concentration has a matrix gas supplying source 1 having a mass flow controlling apparatus 8 downstream, at least one component supplying source 2 and a measuring apparatus 3 for measuring at least one trace component. The measuring apparatus 3 is a micro drop measuring apparatus having at least one nozzle 4. The nozzle 4 continuously emits the micro drops, has an opening in a vaporizing pipe 6 that the matrix gas flows, and can be contracted by a piezoelectric element 16 operated by measuring pulses generated in response to an intended transmitting quantity per unit time so as to create the micro drops.
申请公布号 JP2002328073(A) 申请公布日期 2002.11.15
申请号 JP20020081625 申请日期 2002.03.22
申请人 GERSTEL SYSTEMTECHNIK GMBH & CO KG 发明人 SCHRAM JURGEN;ALBINUS THOMAS
分类号 G01N1/00;G01N30/16;(IPC1-7):G01N1/00 主分类号 G01N1/00
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