发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING GAS MIXTURE AND METHOD FOR CALIBRATING GAS ANALYZING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a gas mixture and a method for calibrating a gas analyzing apparatus which can prepare the gas mixture with a volatile component of known concentration used for a calibrating reference or an industrial process in the range of very low concentration on-line. SOLUTION: The apparatus for manufacturing the gas mixture containing at least one gas trace component with the predetermined concentration has a matrix gas supplying source 1 having a mass flow controlling apparatus 8 downstream, at least one component supplying source 2 and a measuring apparatus 3 for measuring at least one trace component. The measuring apparatus 3 is a micro drop measuring apparatus having at least one nozzle 4. The nozzle 4 continuously emits the micro drops, has an opening in a vaporizing pipe 6 that the matrix gas flows, and can be contracted by a piezoelectric element 16 operated by measuring pulses generated in response to an intended transmitting quantity per unit time so as to create the micro drops.
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申请公布号 |
JP2002328073(A) |
申请公布日期 |
2002.11.15 |
申请号 |
JP20020081625 |
申请日期 |
2002.03.22 |
申请人 |
GERSTEL SYSTEMTECHNIK GMBH & CO KG |
发明人 |
SCHRAM JURGEN;ALBINUS THOMAS |
分类号 |
G01N1/00;G01N30/16;(IPC1-7):G01N1/00 |
主分类号 |
G01N1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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