POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in sensitivity and resolving power, ensuring excellent resolving power and pattern profile even if time passes considerably until after-heating after exposure and having small density dependency in microphotofabrication using far ultraviolet light, particularly ArF excimer laser light. SOLUTION: The positive resist composition contains two or more photo-acid generating agents each with a specified structure and a polymer having repeating structural units with different specified structures and also having a group which is decomposed by the action of an acid.