SPUTTERING APPARATUS, DRIVING METHOD THEREOF AND METHOD OF MANUFACTURING A PANEL USING THE SAME

摘要

A sputtering apparatus, a driving method thereof and a method for manufacturing a panel using the same are provided to reduce the number of targe devices by applying the targe devices which are able to be rotated. A first target device(21) is located to the horizontal direction. A second and a third target devices(22,23) having a rectangular shape extended longitudinally are located to the longitudinal direction at both sides of the first target device. A fourth and a fifth target devices(24,25) are located at both top and bottom sides of the first target device. The first target device is fixed by a fixing tool, thus comprise no axis. The second target device or the fifth target device can be rotated, thus comprises a predetermined axis.