发明名称 FORMATION OF IMPURITY DIFFUSION LAYER IN COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a method for diffusing impurities allowing more preferable light emitting diodes, by enabling distribution and density of a zinc diffusion layer to still contribute to the improvement in luminance. SOLUTION: In diffusing zinc into a wafer 2 of GaAs compound using ZnAs2 as a diffusion source 3 by a sealed tube method, the wafer 2 is continuously heated for a specified time at a temperature range wherein zinc can be diffused into the wafer 2, and then cooled to a temperature wherein zinc does not diffuse from the surface of the wafer 2, and continuously heat-treated for a specified time at the above temperature, which outwardly diffuses zinc once diffuse inwardly from the surface of the wafer 2 to decrease the carrier density of a p-n junction region.
申请公布号 JPH11204445(A) 申请公布日期 1999.07.30
申请号 JP19980003020 申请日期 1998.01.09
申请人 MATSUSHITA ELECTRON CORP 发明人 FUKUDA YASUHIKO;KOBAYASHI YUJI;KITAZONO TOSHIRO
分类号 H01L21/22;H01L33/30 主分类号 H01L21/22
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