发明名称 METHODS OF AND APPARATUS FOR MAKING HIGH ASPECT RATIO MICROELECTROMECHANICAL STRUCTURES
摘要 Various embodiments of the invention provide techniques for forming structures (e.g. HARMS-type structures) via an electrochemical extrusion process. Preferred embodiments perform the extrusion processes via depositions through anodeless conformable contact masks that are initially pressed against substrates that are then progressively pulled away or separated as the depositions thicken. A pattern of deposition may vary over the course of deposition by including more complex relative motion between the mask and the substrate elements. Such complex motion may include rotational components or translational motions having components that are not parallel to an axis of separation. More complex structures may be formed by combining the electrochemical extrusion process with the selective deposition, blanket deposition, planarization, etching, and multi-layer operations of a multi-layer electrochemical fabrication process.
申请公布号 US2006283710(A1) 申请公布日期 2006.12.21
申请号 US20020272254 申请日期 2002.10.15
申请人 MEMGEN CORPORATION 发明人 COHEN ADAM L.;ZHANG GANG;LE QUI T.
分类号 C25D5/02;C25D1/00;C25D7/12;C25D21/14;H01L21/288;H01L21/768;H05K3/24 主分类号 C25D5/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利