发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING PATTERN BY USING THE PHOTOSENSITIVE FILM, AND PRINTED BOARD
摘要 Disclosed is a photosensitive resin composition having good plating resistance, sensitivity, developability and adhesive force. Also disclosed are a photosensitive film, a method for forming a pattern using the photosensitive film, and a printed board. The photosensitive resin composition is characterized by containing a binder, a polymerizable compound, a photopolymerization initiator, an inorganic filler and an adhesion accelerator. The photosensitive film is characterized in that it is obtained by arranging a photosensitive layer, which is composed of the photosensitive resin composition, on a supporting body. The method for forming a pattern is characterized by comprising at least a step wherein the photosensitive layer of the photosensitive film is exposed to light. The printed board is characterized by having a permanent pattern formed by the pattern forming method.
申请公布号 KR20100014433(A) 申请公布日期 2010.02.10
申请号 KR20097019360 申请日期 2008.02.05
申请人 FUJIFILM CORPORATION 发明人 IKEDA KIMI
分类号 G03F7/031;G03F7/085;H05K3/28 主分类号 G03F7/031
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