发明名称 Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device
摘要 The present invention provides a method for manufacturing an optical element to be used for an optical system and an optical instrument using the optical system, and a method for manufacturing a device using the optical instrument, wherein the optical element is manufactured by the steps including the steps for processing a high purity silica glass by lithography, and the hydrogen molecule content is adjusted after manufacturing the optical element.
申请公布号 US2001055826(A1) 申请公布日期 2001.12.27
申请号 US20010875009 申请日期 2001.06.07
申请人 CHIBA KEIKO 发明人 CHIBA KEIKO
分类号 C03B20/00;C03C3/06;C03C15/00;G02B1/00;G02B3/00;G02B5/18;G03F7/20;H01L21/027;(IPC1-7):H01L21/00 主分类号 C03B20/00
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