发明名称 |
Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device |
摘要 |
The present invention provides a method for manufacturing an optical element to be used for an optical system and an optical instrument using the optical system, and a method for manufacturing a device using the optical instrument, wherein the optical element is manufactured by the steps including the steps for processing a high purity silica glass by lithography, and the hydrogen molecule content is adjusted after manufacturing the optical element.
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申请公布号 |
US2001055826(A1) |
申请公布日期 |
2001.12.27 |
申请号 |
US20010875009 |
申请日期 |
2001.06.07 |
申请人 |
CHIBA KEIKO |
发明人 |
CHIBA KEIKO |
分类号 |
C03B20/00;C03C3/06;C03C15/00;G02B1/00;G02B3/00;G02B5/18;G03F7/20;H01L21/027;(IPC1-7):H01L21/00 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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