Heater block and a substrate treatment apparatus

摘要

The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.

主权项

1. A heater block for a substrate treatment apparatus, the heater block comprising:
heating lamps positioned to transfer heat from one side of the heater block to a target subjected to heat treatment, wherein the heating lamps have different arrangement patterns in a plurality of regions on said one side, wherein the plurality of regions are divided into a central region at an innermost portion of said one side of the heater block and a peripheral region external to the central region, wherein the heating lamps include circular shaped heating lamps and T-shaped heating lamps, wherein the circular shaped heating lamps are disposed on the central region and the T-shaped heating lamps heating lamps are disposed on the peripheral region; wherein the peripheral region is divided into a plurality of regions along a distance from a central point; and wherein the heating lamps disposed on the peripheral region have a combined arrangement of at least two or more arrangements among a concentric arrangement, a tessellated arrangement, and a linear arrangement.