CLOTH FOR POLISHING SEMICONDUCTOR WAFER,申请号JP19910263631-传众专利搜索

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发明名称	CLOTH FOR POLISHING SEMICONDUCTOR WAFER
摘要
申请公布号	JPH058178(A)	申请公布日期	1993.01.19
申请号	JP19910263631	申请日期	1991.10.11
申请人	RODEELE NITTA KK	发明人	KUBO NAOTO
分类号	B24D11/00;C09K3/14;D06M13/02;D06M13/325;D06M13/335;D06M15/564;H01L21/304	主分类号	B24D11/00
代理机构		代理人
主权项
地址

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