| 摘要 |
PURPOSE:To provide an exposure device and a method for exposing a work in which a space for setting the exposure device can be made small, an upper printing frame can be easily exchanged in the case of deterioration, a lower printing frame can adequately perform the suction and separation of the work, the power consumption can be reduced, and the constitution of the vacuum frame and the positioning of the work can be efficiently and accurately performed and having many advantages other than the above. CONSTITUTION:This exposure device is provided with a first alignment stage B for the work, a first exposing stage C, an inversion stage D, a second alignment stage E and a second exposing stage F; the first alignment stage B, the inversion stage D and the second alignment stage E are disposed in a line the first and second exposing stages C and F are respectively disposed in a direction orthogonally crossed with the line for first and second alignment stages B and E; and an ultraviolet ray irradiating stage H is provided between the first and the second exposing stages C and F. |
