| 摘要 |
<p>A processing apparatus (l00) comprising an air-tight processing tank (l02), an exhaust system (l28) for exhausting a gas from the processing tank (l02), and a baffle plate (l20) dividing the interior of the processing tank (l02) into a processing space (l22) in which an object material is subjected to a predetermined process and an exhaust path (l24) communicating with the exhaust system (l28), characterized in that the baffle plate (l20) is provided with a plurality of slits (l20a) for communicating the processing space (l22) and exhaust path (l24) with each other, the portion of an inner surface of each slit (l20a) which is on the side of the processing space being formed as a taper surface (l32) extending by a distance corresponding to not less than l/4 of a depth of the slit.</p> |
