| 摘要 |
PURPOSE: A photolithography device is provided to precisely align the position of a concave lens and a concave mirror without moving a jig which is used for optically adjusting the position of the concave lens and the concave mirror. CONSTITUTION: A photolithography device comprises a light source. An illuminating optical unit are provided to pass/shut off the light generated from the light source. A mask has a pattern for selectively transmitting an incident light. A projection lens unit is installed at a light route so as to focus the incident light on a substrate. The projection lens unit includes a prism for converting the route of the incident light, concave and convex lenses(53',55') for focusing or emitting the incident light and a concave mirror(57') for reflecting the incident light. The concave lens(53') and the concave mirror(57') are positioned in such a manner that the auto collimation points of the concave lens(53') and the concave mirror(57') are matched with each other at a point of an optical axis.
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