| 摘要 |
PURPOSE: A photolithography apparatus is provided, which uses a calibration lens unit to reduce the focal depth, thereby to allow the position of focus to be controlled easily and to reduce the error range. CONSTITUTION: The photolithography apparatus comprises a light source(10) which radiates the light; a lighting lens unit(30) which controls the size of the light radiated from the light source and allows the light to pass through or be blocked; a projection lens unit(50) which projects the light from the lighting lens unit(30) onto the substrate; a mask(40) which is placed between the lighting lens unit(30) and the projection lens unit(50), and has the pattern for exposure and position arrangement; a calibration lens unit(70) which is placed in the light path between the projection lens unit(50) and the substrate, and whose numerical aperture is larger than that of the projection lens unit(50); and a sensor(60) which is placed below the substrate, receives the light from the mask(40) and senses the position of the mask.
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