发明名称 METHOD AND DEVICE FOR LASER ANNEALING
摘要 A method and a device for laser annealing capable of uniformly irradiating a beam, wherein only the beam having a Gaussian distribution excluding portions with high light-intensity can be formed in a linear sectional shape by an optical system (57) by rotating, a specified angle, the beam (41) from a laser beam source by a rotating means (42) even if a nonuniform intensity distribution is present in the beam pattern of the beam (41) from the laser beam source, whereby the beam can be irradiated uniformly to a specimen (50).
申请公布号 WO02056355(A1) 申请公布日期 2002.07.18
申请号 WO2002JP00189 申请日期 2002.01.15
申请人 ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD.;SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;KAWAGUCHI, NORIHITO;NISHIDA, KENICHIRO;ISHII, MIKITO;YAGI, TAKEHITO;MASAKI, MIYUKI;YOSHINOUCHI, ATSUSHI;TANAKA, KOICHIRO 发明人 KAWAGUCHI, NORIHITO;NISHIDA, KENICHIRO;ISHII, MIKITO;YAGI, TAKEHITO;MASAKI, MIYUKI;YOSHINOUCHI, ATSUSHI;TANAKA, KOICHIRO
分类号 A61B18/20;B23K26/06;B23K26/073;H01L21/268;H01S3/00;(IPC1-7):H01L21/268 主分类号 A61B18/20
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