发明名称 TERAHERTZ WAVE RADIATION APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a terahertz wave radiation apparatus, and a manufacturing method thereof which enhances a radiation efficiency for the terahertz wave and manufactures the apparatus at a low cost. SOLUTION: The terahertz wave radiation apparatus comprises: an SiC wafer 201; a CNW layer 202 consisting of a carbon nano-structure and formed selectively in a part of the surface of the SiC wafer 201; a cathode electrode layer 203 electrically connected to the SiC wafer 201; an anode transparent electrode layer 205 located above the SiC wafer 201 so that it is apart from and opposed to the CNW layer 202; and an insulating electrically isolating layer 204 located between the SiC wafer 201 and the anode transparent electrode layer 205 and having a through hole extending from the anode transparent electrode layer 205 to the CNW layer 202. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008091541(A) 申请公布日期 2008.04.17
申请号 JP20060269397 申请日期 2006.09.29
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SING VIRAHAMPAL
分类号 H01S1/02 主分类号 H01S1/02
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