发明名称 Stage device, exposure apparatus and device manufacturing method
摘要 A device includes a stage (4), a force applying unit (7, 10) arranged to apply a magnetically repulsive force to the stage (4), the force applying unit (7, 10) including a first magnet (9) provided at the stage (4), and a second magnet provided at an end of a movement stroke of the stage (4) so as to face the first magnet (9), a driving unit (5, 6) arranged to drive the stage (4) within the movement stroke, a magnetic-flux reinforcement unit (11, 13) arranged to reinforce magnetic flux of the second magnet, and a magnetic shield (16) arranged to shield the magnetic flux of the second magnet.
申请公布号 EP1944650(A2) 申请公布日期 2008.07.16
申请号 EP20080100455 申请日期 2008.01.14
申请人 CANON KABUSHIKI KAISHA 发明人 SHIBATA, YUGO
分类号 G03B27/58 主分类号 G03B27/58
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