| 摘要 |
An exposure apparatus includes an optical system irradiating a first exposure light from a first pattern and a second exposure light from a second pattern onto a first exposure area and second exposure area respectively to form an image of the first pattern and an image of the second pattern on the first and exposing areas respectively; a light receiving device receiving a detecting light via at least a part of the optical system; and a detection system obtaining, in parallel to at least a part of an operation of multiple-exposing a predetermined area on a substrate with the images of first and second patterns, informations about a positional relationship between the image of the first pattern and the substrate and a positional relationship between the image of the second pattern and the substrate via at least a part of the optical system. The substrate can be efficiently well multi-exposed.
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