发明名称 APPARATUS FOR PROCESSING SUBSTRATES
摘要 A substrate processing apparatus is provided to extend the lifespan by preventing the outflow of the process fluid from the bath. A substrate processing apparatus comprises a bath portion(10), and a brushing part(30) and a leak prevention unit(40). The bath portion provides the work space performing the substrate processing process. The brushing part has an axis of rotation(31) and a brush(35). The axis of rotation passes through axle holes(13,17) of the side wall of the bath portion. The brush is connected to the axis of rotation and blushes the surface of substrate. The leak prevention unit has a rotational plate(51) and a blade(55). The rotational plate is connected to the axis of rotation and rotates with the axis of rotation. The blade is connected to the rotational plate and injects the air into the axle holes of the side wall of the bath portion.
申请公布号 KR20090022547(A) 申请公布日期 2009.03.04
申请号 KR20070088000 申请日期 2007.08.31
申请人 SEMES CO., LTD. 发明人 LEE, MYUNG GI;LEE, WOO SONG
分类号 H01L21/304 主分类号 H01L21/304
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