发明名称 Method of Transferring a Substrate, Transfer System and Lithographic Projection Apparatus
摘要 A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provided on the first substrate holder. Subsequently, a position error of the substrate is measured, and positioning adjustment data are calculated based on the position error as measured. Then, the second substrate holder is moved relative to a reference position thereof in accordance with the positioning adjustment data. Finally, the substrate is transferred by means of the transfer unit from the first substrate holder to the second substrate holder in accordance with the transfer data, and placed on the second substrate holder as moved.
申请公布号 US2009155026(A1) 申请公布日期 2009.06.18
申请号 US20080248290 申请日期 2008.10.09
申请人 ASML NETHERLANDS B.V. 发明人 ALBERTI JOZEF AUGUSTINUS MARIA;VAN NUNEN GERARDUS PETRUS MATTHIJS;GROENSMIT FRANS ERIK;COMPEN RENE THEODORUS PETRUS
分类号 H01L21/66;G05B19/19;H01L21/68 主分类号 H01L21/66
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