GAS COOLED MINIMAL CONTACT AREA (MCA) ELECTROSTATIC CHUCK(ESC) FOR ALUMINUM NITRIDE (ALN) PVD PROCESS

摘要

Embodiments of the disclosure include an electrostatic chuck assembly, a processing chamber and a method of maintaining a temperature of a substrate is provided. In one embodiment, an electrostatic chuck assembly is provided that includes an electrostatic chuck, a cooling plate and a gas box. The cooling plate includes a gas channel formed therein. The gas box is operable to control a flow of cooling gas through the gas channel.