发明名称 NEGATIVE TYPE RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a negative type chemical amplification type resist composition for electron beams or X-rays excellent in sensitivity and resolving power and giving a rectangular profile. SOLUTION: The chemical amplification type negative type resist composition contains an alkali-soluble resin containing a specified structural unit, a radiation sensitive acid generating agent and a crosslinker which causes crosslinking under an acid.
申请公布号 JP2002049151(A) 申请公布日期 2002.02.15
申请号 JP20000235949 申请日期 2000.08.03
申请人 FUJI PHOTO FILM CO LTD 发明人 ADEGAWA YUTAKA;UENISHI KAZUYA;SHIRAKAWA KOJI
分类号 C08F12/22;C08K5/00;C08L25/18;G03F7/004;G03F7/038;H01L21/027 主分类号 C08F12/22
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