发明名称 |
NEGATIVE TYPE RESIST COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a negative type chemical amplification type resist composition for electron beams or X-rays excellent in sensitivity and resolving power and giving a rectangular profile. SOLUTION: The chemical amplification type negative type resist composition contains an alkali-soluble resin containing a specified structural unit, a radiation sensitive acid generating agent and a crosslinker which causes crosslinking under an acid. |
申请公布号 |
JP2002049151(A) |
申请公布日期 |
2002.02.15 |
申请号 |
JP20000235949 |
申请日期 |
2000.08.03 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
ADEGAWA YUTAKA;UENISHI KAZUYA;SHIRAKAWA KOJI |
分类号 |
C08F12/22;C08K5/00;C08L25/18;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C08F12/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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