| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To provide an arrangement to remove liquid from the vicinity of a substrate effectively without generating vibration or other disturbances.SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at or below the bubble point of the porous member so that a single-phase liquid flow may be obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.SELECTED DRAWING: Figure 1 |
| 申请公布号 |
JP2016153918(A) |
申请公布日期 |
2016.08.25 |
| 申请号 |
JP20160097814 |
申请日期 |
2016.05.16 |
| 申请人 |
ASML NETHERLANDS BV;ASML HOLDING NV |
发明人 |
KEMPER NICOLAAS R;COX HENRIKUS HERMAN MARIE;DONDERS SJOERD NICOLAAS L;GRAAF ROELOF FREDERICK DE;HOOGENDAM CHRISTIAAN ALEXANDER;KATE NICOLAAS T;JEROEN JOHANNES SOPHIA MARIA MERTENS;VAN DER MEULEN FRITS;HERMAN MARIA TEUNISSEN FRANCISCUS JOHANNES;VAN DER TOORN JAN-GERARD C;VERHAGEN MARTINUS CORNELIS MARIA;BELFROID STEFAN PHILIP CHRISTIAAN;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
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