PLASMA TREATING DEVICE AND PLASMA TREATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma treating device capable of reducing a cost, enhanc ing plasma density and the ability. SOLUTION: The space between electrodes 2 and 3 arranged to face each other is formed as a discharge space 34. The discharge space 34 side of at least one electrode 2 (or electrode 3) of the electrodes 2 and 3 arranged to face each other is provided with a dielectric substance 32. This plasma treating device generates a dielectric substance barrier discharge in the discharge space 34 at the pressure near to atmospheric pressure by supplying plasma-forming gas to the discharge space 34 and impressing voltage between the electrodes 2 and 3. The waveform of the voltage to be impressed between the electrodes 2 and 3 is specified to an alternating voltage waveform having no quiescent time and the rising time of the alternating voltage waveform is confined to <=100 μsec.