| 摘要 |
<p>PURPOSE:To obtain a vacuum suction equipment which is used in a clean atmosphere like a semiconductor manufacturing equipment, and a control method of the vacuum suction equipment. CONSTITUTION:A suction piping channel is constituted as follows; a vacuum pad 1 is coupled with a vacuum pump 7 via a first piping 2, a suction confirming means 3 and a first vacuum valve 4 are arranged in series in the route of the first piping 2, and a first flow rate controlling means 6 is arranged in parallel with the first vacuum valve 4. A suction relieving piping channel is constituted as follows; a vacuum pad 1 is coupled with a high pressure air source 12 via a second piping 8 so as to be in parallel with the first piping 2, and in the route of the second piping 8, an air filter 9, a second flow rate controlling means 10 and a second vacuum valve 11 are arranged in series. Dust can be prevented from being discharged in a clean room by a simple pneumatic circuit and the yield of devices is improved.</p> |
