Schichtaufbau mit einer ferroelektrischen Schicht und Herstellverfahren
摘要
A stratified structure is disclosed with a substrate (S), a platinum layer (PS) and a ferroelectric layer (FS), said structure comprising between the platinum layer (PS) and the substrate (S) an intermediate layer (ZS) of amorphous aluminium oxide.
申请公布号
DE19630110(A1)
申请公布日期
1998.01.29
申请号
DE19961030110
申请日期
1996.07.25
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
BRUCHHAUS, RAINER, DR., 80997 MUENCHEN, DE;PITZER, DANA, 80939 MUENCHEN, DE
