| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate carrying device having a delivery means capable of limiting the horizontal movement of a substrate and a substrate processing device using it. SOLUTION: A delivery mechanism 7 to temporarily hold a wafer W is provided with arc-shaped guide members 51 and 52 to limit the horizontal movement of the wafer W and peripheral supporting members 55, 56, and 57 installed projectedly from the guide members 51 and 52 to the inside. The peripheral support members 55, 56, and 57 support the lower surface peripheral part of the wafer W. The guide members 51 and 52 are raised and lowered by a lifting mechanism 60 or an air cylinder. During the raising and lowering, the movement of the wafer W in horizontal direction is limited by the guide members 51 and 52. Thus, because the wafer W is supported on its lower surface peripheral part, there is no risk that particles adhere near the center of the wafer W. |
