| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device of a structure, wherein the contact pressure of a cleaning body to the surface of a material to be cleaned, is easily set to as to prevent giving scratches on the surface of the material to be cleaned and at the same time, even of a deviation, nonunieformity is density or the like is generated in the cleaning body, the cleaning body copes with it to clean the surface of the material to be cleaned with its good follow-up power as it maintains the prescribed contact pressure. SOLUTION: A material W to be cleaned is held in such a way that the surface of an object of cleaning of the material W is made to face to a cleaning body 51, the cleaning body 51 is rotatably supported by an arm member 21, which can be freely whirled and elevated, and the body 51 is supported by the arm member 21 in a vertically movable state. The material W and the cleaning body 51 are relatively moved in a state that the cleaning body 51 is brought into contact with the surface of the object of cleaning of the material W at a prescribed contact pressure to clean the surface o the object of cleaning of the material W. |
