发明名称 |
SUBSTRATE-HOLDING CHUCK, MANUFACTURE THEREOF, EXPOSURE METHOD, MANUFACTURE OF SEMICONDUCTOR DEVICE AND ALIGNER |
摘要 |
<p>PROBLEM TO BE SOLVED: To hold a substrate without impairing the planarity of the substrate, when the substrate of a silicon wafer, etc., is vacuum chucked. SOLUTION: A pin contact substrate holding chuck is composed of a glass substrate 10. This substrate holding chuck 10 is formed by providing a rugged surface on the glass substrate which is polished in a highly precise manner. The rugged surface consists of an auxiliary holding body 2, a first annular wall body 3 and a second annular wall body 4.</p> |
申请公布号 |
JP2000286329(A) |
申请公布日期 |
2000.10.13 |
申请号 |
JP19990093308 |
申请日期 |
1999.03.31 |
申请人 |
HOYA CORP |
发明人 |
MATSUMOTO KENJI;TAKEHANA YOICHI;FUKAZAKI SHIYOUGO |
分类号 |
B23Q3/08;G03F7/20;H01L21/027;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
B23Q3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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