发明名称 SUBSTRATE-HOLDING CHUCK, MANUFACTURE THEREOF, EXPOSURE METHOD, MANUFACTURE OF SEMICONDUCTOR DEVICE AND ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To hold a substrate without impairing the planarity of the substrate, when the substrate of a silicon wafer, etc., is vacuum chucked. SOLUTION: A pin contact substrate holding chuck is composed of a glass substrate 10. This substrate holding chuck 10 is formed by providing a rugged surface on the glass substrate which is polished in a highly precise manner. The rugged surface consists of an auxiliary holding body 2, a first annular wall body 3 and a second annular wall body 4.</p>
申请公布号 JP2000286329(A) 申请公布日期 2000.10.13
申请号 JP19990093308 申请日期 1999.03.31
申请人 HOYA CORP 发明人 MATSUMOTO KENJI;TAKEHANA YOICHI;FUKAZAKI SHIYOUGO
分类号 B23Q3/08;G03F7/20;H01L21/027;H01L21/683;(IPC1-7):H01L21/68 主分类号 B23Q3/08
代理机构 代理人
主权项
地址