A method for fabricating or prototyping a nanoscale object is disclosed. The method includes defining a sequence of nanolayers that represent the nanoscale object, constructing a current nanolayer (104) on a first surface (108), and depositing a sacrificial layer (112) to cover the first surface but not the nanolayer. The nanolayer represents a slice of the nanoscale object. The nanolayer and the sacrificial layer provide a second surface on which a next nanolayer is constructed. The above construction and deposition steps are repeated if the next nanolayer is not the last nanolayer. The method also includes removing the sacrificial layers to produce the nanoscale object.
申请公布号
WO0158655(A8)
申请公布日期
2002.01.03
申请号
WO2001US04326
申请日期
2001.02.08
申请人
UNIVERSITY OF SOUTHERN CALIFORNIA;REQUICHA, ARISTIDES;KOEL, BRUCE, E.;RESCH, ROLAND;LEWIS, DIANA