| 发明名称 |
Control of etch and deposition processes |
| 摘要 |
This invention relates to the control of etch and deposition processes in the manufacture of semiconductor devices, microelectronic machines (MEMs), and waveguides.
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| 申请公布号 |
US2005042777(A1) |
申请公布日期 |
2005.02.24 |
| 申请号 |
US20030644274 |
申请日期 |
2003.08.20 |
| 申请人 |
THE BOC GROUP INC. |
发明人 |
BOGER MICHAEL STEPHEN;HOLBROOK MARK;HEASON DAVID;L'HOSTIS FLORIAN;REEVE DAVID |
| 分类号 |
B81C99/00;G01B11/06;G01N21/21;H01L21/00;H01L21/3065;H01L21/311;H01L21/3213;H01L21/66;H01L21/768;(IPC1-7):H01L21/76;G01R31/26;H01L21/302;H01L21/461 |
主分类号 |
B81C99/00 |
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