METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT AND MAGNETORESISTIVE ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a magnetoresistive element in which the deterioration in magnetic characteristics is suppressed. SOLUTION: The magnetoresistive element is manufactured through: a first step of forming a magnetic film 3 over the entire top surface of a silicon substrate 1 and forming a first insulating film 4 having a predetermined pattern for forming a predetermined pattern of the magnetic film 3 on the top surface of the magnetic film 3 by isotropic etching; and a second step of forming the magnetic film 3 in the predetermined pattern based upon the predetermined pattern of the first insulating film 4 by anisotropic etching. COPYRIGHT: (C)2009,JPO&INPIT