发明名称 Exposure apparatus, semiconductor device manufacturing method, exposure apparatus maintenance method and semiconductor manufacturing factory
摘要 An exposure apparatus that selects an exposure method that matches exposure conditions, from among a plurality of exposure methods includes an exposure method determining unit for switching between exposure methods and determining an exposure method taking into account at least two of a plurality of evaluation item values calculated based on the exposure conditions, and the exposure method determining unit switches among constant speed scanning exposure method, accelerated/decelerated scanning exposure method and static exposure method.
申请公布号 US2002039845(A1) 申请公布日期 2002.04.04
申请号 US20010964648 申请日期 2001.09.28
申请人 YOSHIMURA KEIJI 发明人 YOSHIMURA KEIJI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/469 主分类号 G03F7/20
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