| 摘要 |
The conventional white-light interferometer, confocal microscope, and ellipsometer are integrated as one device set in a functional sense, and the geometrical parameters conventionally measured may be deduced on the integrated device. Thus, the advantages and efficacies of equipment cost saving, on-line measuring, rapid monitoring, reduced manufacturing time, and reduced possibility of object damage during the manufacturing process may be secured, compared with the prior art. |
| 主权项 |
1. An optically measurement device for measuring a plurality of parameters, comprising:
a light source unit, comprising:
an external light source;a collimation unit, coupling the external light source to provide a collimated reference light and a collimated subject light; anda polarizer unit, polarizing the collimated reference light and the collimated subject light, to obtain a polarized reference light and a polarized subject light, the polarized reference light propagating on a propagating path; an aperture unit, comprising a reference light aperture, controlling a light flux of the polarized reference light, having an open and close states, and closing the propagating path of the polarized reference light when the close state is acted; an incident light aperture, controlling a light flux of the polarized subject light; and a measured light aperture; a light splitting unit, diving the polarized light into the reference light and the polarized subject light and coupling the reference light and the polarized subject light onto a first path and a second path, respectively; a measured end unit, locating on the second path, receiving and focusing the polarized subject light to the measured object, the measured object reflecting the polarized subject light passing the light-splitting unit to generate a measured light, the measured light being reflected onto a third path reverse to the second path; a reference light processing unit, locating on the first path, and reflecting the polarized reference light to generate a collimated effect reference light onto the third path when the reference light aperture is at the open state and the optical measurement device is on an interferometer mode and the measured light and the collimated effect reference light jointly generate an interference image through the light-splitting unit, and generating a guided measured image on the third path when the reference light aperture is at the close state and the optical measurement device is on a microscope mode; a spectrum obtaining/image acquiring unit, comprising a polarized light splitting unit, guiding the interference image on the interferometer mode and guiding the measured image on the microscope mode to obtain a first to-be-analyzed image and a second to-be-analyzed image; a spectrum obtaining unit, receiving the first to-be-analyzed image to generate a spectrum data; and an image acquiring unit, receiving the second to-be-analyzed image; and a control-processing unit, performing steps of:
controlling the measured object to move along a vertical direction on the interferometer mode, and analyzing the second to-be-analyzed image, thereby securing a zero optical path difference for each of a plurality of pixels in the second to-be-analyzed image and recording the zero optical path difference for each of the plurality of pixels in the second to-be-analyzed image, thereby enabling the spectrum obtaining unit to obtain the spectrum data, thereby calculating a surface topography of the measured object according to at least one of the spectrum data and the second to-be-analyzed image;closing the reference light aperture to enable the optical measurement device to enter the microscope mode, enabling the spectrum obtaining unit to obtain the spectrum data when the zero optical path difference exists;activating the measured object to move along the vertical direction, analyzing a focal information of each of the plurality of pixels in the second to-be-analyzed image to obtain a full focal colorful image and a full focal gray-level image, and establishing a depth response curve;activating the measured object to move laterally, to obtain a large-range surface profile according to the spectrum data, the depth response curve and an axial dispersion extent; anddeducing a thin-film thickness and an another surface profile according to the spectrum data when the zero optical path difference face exists, when the measured object is a substrate having a coating layer thereon,wherein the surface profile is the another surface profile and the control-processing unit selects to only calculate and present one of the surface profile and the another surface profile. |
