CHEMICAL AMPLIFICATION TYPE POSITIVE TYPE RESIST COMPOSITION AND SULFONIUM SALT

摘要

PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type resist composition having various performances as a resist such as sensitivity and resolution and giving improved line edge roughness. SOLUTION: The chemical amplification type positive type resist composition contains an alkali-insoluble or slightly alkali-soluble resin having a polymerization unit with an acid labile group and made alkali-soluble by the action of an acid and an acid generating agent. At least one of sulfonium salts of formulae (I) and (I') and at least one of onium salts of formulae (IIa) and (IIb) are used in combination as the acid generating agent.