METHOD OF MAKING RESIST PATTERN, METHOD OF PATTERNING THIN FILM AND METHOD OF MANUFACTURING MICRODEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of making resist patterns for forming fine patterning thin films and a method of patterning the thin films using the same. SOLUTION: After a thin film 2 to be milled is formed on a substrate 1, a polymethyl glutarimide layer 3 and a photoresist layer 4 of a positive type are formed by coating application. The photoresist layer 4 is thereafter exposed through a mask 5 and is developed to form preresist patterns 6. The preresist patterns 6 are subjected to ashing treatment, by which the narrowed resist patterns 7 are obtained. The thin film 2 to be milled is then subjected to milling treatment through the resist patterns 7 as a mask, by which the patterning thin films 9 are obtained.