发明名称 HOT PLATE FOR RESIST HARDENING
摘要 PURPOSE:To enable forming the thick or thin resist film exhibiting functions in later process by providing difference in temperature distribution according to the film thickness. CONSTITUTION:A heat generating resistance coil 4 is provided with a part where the winding density of coil is made high, in order to increase the heat generation amount per unit length on a hot plate as compared with the other part. When a glass substrate 2 is put on a hot plate 3 for resist hardening, and the hardening of the resist 1 is begun, the evaporation of solvent in the resist 1 corresponding with the part where the temperature of the hot plate 3 is high is vigorous. Since the surface tension of resin is generally larger than that of the solvent, the surface tension of the resist of the part whose temperature is high is larger than that of the other part. As a result, the gradient of the surface tension generates between the part where the temperature of hot plate 3 is high and the other part, and so the resist flows from the low temperature side to the high temperature side. Thereby, after the resist is hardened, the film thickness of the resist corresponding with the part where the temperature of the hot plate 3 is high can be thickly formed.
申请公布号 JPH01307224(A) 申请公布日期 1989.12.12
申请号 JP19880138806 申请日期 1988.06.06
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INAMI TAKASHI;ASO SHINICHI;TAKEGAWA HIROZO;AKUTAGAWA RYUTARO;SHIMIZU TOKIHIKO
分类号 G03F7/00;G03F7/38;H01L21/027;H01L21/30 主分类号 G03F7/00
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