| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a device and method of correcting a pattern defect on a substrate having a wide-ranging thickness and shape. SOLUTION: The pattern correcting device is equipped with a substrate table 10, a laser beam irradiating device 1, an optical system 21 that adjusts the laser beam to a micro beam diameter, and a table control means for controlling the movement of the table 10 so that the beam scans the entirety of the area to be corrected.</p> |
