发明名称 INSPECTION DEVICE AND METHOD OF PROJECTION OPTICAL SYSTEM, ALIGNER, AND MANUFACTURE OF MICRO DEVICE
摘要 PROBLEM TO BE SOLVED: To achieve an inspection device and method for excluding the influence of vibration with a low frequency when inspecting a projection optical system without using any expensive anti-vibration device, an aligner for accurate exposure, and further a method for manufacturing a micro device for improving a product yield. SOLUTION: A test pattern formed on a test reticle Rt is projected onto a light reception surface 42 of an image pickup mechanism 41 via a projection optical system PLe to be inspected. The light reception time of a projection image on the light reception surface 42 is changed for each aberration to be measured. In this case, when the aberration to be obtained based on the contrast of the projection image is to be measured, the said light reception time is set to approximately 1/2 cycle of vibration with the minimum frequency out of vibrations operating on an inspection device body 22. Also, when the aberration to be obtained based on the coordinates positions of the said projection image is to be measured, the said light reception time is set to approximately 1 cycle of the vibration with the said minimum frequency.
申请公布号 JP2000283889(A) 申请公布日期 2000.10.13
申请号 JP19990092111 申请日期 1999.03.31
申请人 NIKON CORP 发明人 SHIMIZU YUSUKE
分类号 H01L21/027;G01M11/02;G03F7/20;(IPC1-7):G01M11/02 主分类号 H01L21/027
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