| 摘要 |
PROBLEM TO BE SOLVED: To obtain a mask which makes it possible to easily obtain images of high-resolution electronic circuit patterns and a projection aligner using the same. SOLUTION: This mask is formed by fitting the surface side drawn with the circuit patterns of a mask substrate drawn with the circuit patterns with a transparent member for dust proofing across a supporting frame or directly. The transparent member is provided with correction means for correcting the change in the optical characteristics after deformation from an ideal shape. |
