发明名称 METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS, OPTICAL MEMBER, PHOTOLITHOGRAPHY MACHINE, AND APPARATUS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of and a device for producing a synthetic quartz glass capable of easily improving the homogeneity of refractive index or strain. <P>SOLUTION: The production device for the synthetic quartz glass is provided with: a hollow synthesizing furnace 10; a burner 11 for forming flame by jetting a silicon compound and a combustion gas in the furnace 10; and a target 12 for growing a deposition intermediate 14 having the depositional face 14a of a protruding form by depositing glass particulates generated in the flame. Further, a heat shield member 13 for controlling spread of the flame is provided around the peripheral edge side of the depositional face 14a. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006265029(A) 申请公布日期 2006.10.05
申请号 JP20050084825 申请日期 2005.03.23
申请人 NIKON CORP 发明人 IWASAKI TAKESHI;FUSHIMI KOICHI
分类号 C03B8/04;G03F1/50;G03F1/60 主分类号 C03B8/04
代理机构 代理人
主权项
地址