发明名称 |
METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS, OPTICAL MEMBER, PHOTOLITHOGRAPHY MACHINE, AND APPARATUS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of and a device for producing a synthetic quartz glass capable of easily improving the homogeneity of refractive index or strain. <P>SOLUTION: The production device for the synthetic quartz glass is provided with: a hollow synthesizing furnace 10; a burner 11 for forming flame by jetting a silicon compound and a combustion gas in the furnace 10; and a target 12 for growing a deposition intermediate 14 having the depositional face 14a of a protruding form by depositing glass particulates generated in the flame. Further, a heat shield member 13 for controlling spread of the flame is provided around the peripheral edge side of the depositional face 14a. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2006265029(A) |
申请公布日期 |
2006.10.05 |
申请号 |
JP20050084825 |
申请日期 |
2005.03.23 |
申请人 |
NIKON CORP |
发明人 |
IWASAKI TAKESHI;FUSHIMI KOICHI |
分类号 |
C03B8/04;G03F1/50;G03F1/60 |
主分类号 |
C03B8/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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