| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to measure continuously positions of a substrate stage by using an interferometer position measurement system. A patterning device supporter(6) is formed to support a patterning device. The patterning device is used for adding a pattern to a sectional area of a radiation beam in order to form a patterned radiation beam. A projection system(18) is formed to project the patterned radiation beam onto a substrate(14) within an exposure station of a lithographic apparatus. A liquid confinement system is formed to confine a liquid(66) in a space between a final element of the projection system and the substrate. A first and second substrate stages are formed to hold substrates. An interferometer position measurement system(60) is formed to measure positions of the first and second substrate stages. The first and second substrate stages are formed and arranged to perform a joint movement for bringing the lithographic apparatus from a first configuration to a second configuration. In the first configuration, the liquid is confined between a first substrate maintained by the first substrate stage and the final element. In the second configuration, the liquid is confined between a second substrate maintained by the second substrate stage and the final element. During the joint movement, the liquid is essentially confined within the space to the final element. The interferometer position measurement system is formed to measure continuously the positions of the first substrate stage and the second substrate stage.</p> |
