摘要 |
FIELD: technological processes.SUBSTANCE: invention relates to cleaning gases from hydrogen sulphide and/or carbon dioxide and can be used in gas, oil and oil processing industries. Absorbent for cleaning gas from HS and COcontains methyl diethanolamine, amino ethyl piperazine, methyl or ethyl ether of diethylene glycol and water.EFFECT: use of said components in certain proportions provides faster recovery of saturated absorbent and higher quality of cleaning gas at reduced consumption of heat energy.1 cl, 2 tbl |