发明名称 イオンビーム照射装置
摘要 PROBLEM TO BE SOLVED: To allow cable to be wired without limiting the internal space of a vacuum chamber, and to prevent a cable from being caught up by an ion beam irradiation device and thereby broken, as well as prevent the cable from being deteriorated by irradiation of an ion beam and gases from being generated from the cable.SOLUTION: In an ion beam irradiation device, a substrate holding member 2 changes the direction of the substrate from a horizontal to a vertical direction and vice versa and also moves the substrate along a rail 18 between a region where an ion beam is irradiated and a region where no ion beam is irradiated. The substrate holding member 2 is connected to a vacuum chamber side by a link 4 which is rotatably connected at one end to the vacuum chamber side and connected at the other end to the substrate holding member 2. The link 4 has a cable for supplying power to a drive device installed on the substrate holding member 2 side wired along the surface thereof and is provided therein with a passage to send a fluid for cooling the substrate holding member 2 or the drive device.
申请公布号 JP5974645(B2) 申请公布日期 2016.08.23
申请号 JP20120127538 申请日期 2012.06.04
申请人 日新イオン機器株式会社 发明人 中澤 喜之;小野田 正敏
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
代理机构 代理人
主权项
地址