发明名称 SMIF container including an electrostatic dissipative reticle support structure
摘要 The present invention is a support structure for supporting a reticle or silicon wafer. The support structure includes a support column and a retaining structure. In addition to retaining a wafer, the present invention also creates a discharge path to remove electrostatic charges from the wafer. The retaining structure mechanically engages each support column to create a discharge path from the wafer to a ground. Specifically, electrostatic charges that dissipate from the wafer travel along the support structure to the support column and exit the SMIF pod through the pod door.
申请公布号 US2002066692(A1) 申请公布日期 2002.06.06
申请号 US20010902519 申请日期 2001.07.10
申请人 SMITH MARK V.;WARTENBERGH ROBERT P.;PENNYBACKER WILLIAM P. 发明人 SMITH MARK V.;WARTENBERGH ROBERT P.;PENNYBACKER WILLIAM P.
分类号 B65D65/30;G03F7/20;H01L21/673;H01L21/687;(IPC1-7):B65D85/30 主分类号 B65D65/30
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