发明名称 SOLVENT MIXTURE AND COATING SOLUTION FOR USE IN MANUFACTURING NEGATIVE TREATING PHOTOSENSITIVE RECORDING MATERIAL
摘要 PURPOSE: To obtain excellent photosensitivity and gradation by preparing a mixture of a polar solvent expressed by R-OH, wherein R is H or 1 to 3C alkyl group, and monoalkylether, etc., and adding a solvent having high boiling point by specified wt.% of the whole solvent mixture. CONSTITUTION: The below-mentioned components are mixed in quantitative proportions so as to obtain a homogeneous mixture. The mixture contains a polar solvent of R-OH, wherein R is H or 1 to 3C alkyl group. It contains monoalkylether or alkylether of glycol having 2 or 3 carbon atoms. Further, it contains an org. solvent having 60 to 160 deg.C boiling point and containing alkane acid alkyl ester or hydroxyalkane acid alkylester or cyclicether. Moreover, a solvent having a higher boiling point than that of each solvent above described is added by 0.1 to 8wt.% of the whole solvent mixture. Thereby, when this solvent mixture is used, photosensitivity and gradation of the obtd. layer of a photosensitive recording material are not decreased compared to a material prepared by using a conventional best coating solvent.
申请公布号 JPH03163455(A) 申请公布日期 1991.07.15
申请号 JP19900197574 申请日期 1990.07.25
申请人 HOECHST AG 发明人 RAINHORUTO ARUNETO;EDERUHARUTO HEERU;UERUNAA FURASU;GIYUNTAA YUNGU
分类号 G03F7/00;G03F7/004;G03F7/021 主分类号 G03F7/00
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