发明名称 |
Method for producing an opening in a layered semiconductor structure or a contact hole in an integrated circuit or DRAM |
摘要 |
The method produces an opening in a layered semiconductor structure having a site intended for an opening. A place-saver is produced on the structure from a first material to be selectively etched to the structure under the first material and to a material adjacent the site. A layer of a second material to which the first material is selectively etchable, is produced over the entire surface of the structure having the place-saver. The opening is formed by at least partially removing the layer of the second material above the place-saver, and removing the place-saver by selective etching.
|
申请公布号 |
US5270236(A) |
申请公布日期 |
1993.12.14 |
申请号 |
US19910692257 |
申请日期 |
1991.04.26 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
ROESNER, WOLFGANG |
分类号 |
H01L21/28;H01L21/302;H01L21/3065;H01L21/768;H01L21/8242;H01L27/10;H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L21/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|