| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer compound for photoresist which is excellent in dry etching resistance, adhesion to substrates, and alkali solubility and exhibits a high solubility in propylene glycol monomethyl ether acetate(PGMEA). SOLUTION: This polymer compound contains (A) 22-40 mol% monomer units represented by formula (I), (B) 20-38 mol% monomer units represented by formula (II), and (C) 22-58 mol% at least one kind of monomer units selected from monomer units represented by formulae (IIIa) and (IIIb). In those formulae, R is H or methyl; and R1, R2, and R3 are each independently a 1-3C alkyl. |
