发明名称 |
TUBULAR REACTION VESSEL AND PROCESS FOR PRODUCING SILICON THEREWITH |
摘要 |
A reaction vessel that avoids excessive temperature load on constituent members thereof, enabling smooth fall and recovery of formed silicon and that even when scaled up to industrially large-dimension production facilities, ensures efficient reaction of raw gases for silicon precipitation and inhibits the occurrence of silicon micropowder and silane oligomer components, thereby realizing long-term industrial production of silicon. In particular, there is provided a tubular reaction vessel having a space surrounded by a vertically extending wall, characterized in that an inflow port for raw gases for silicon precipitation is disposed at an upper part thereof and a precipitated silicon discharge port at a lower end thereof and that flow resistance increase sites are provided on a wall surface of tubular reaction vessel brought into contact with raw gases. The flow resistance increase sites are each at least one selected from among a protrusion, depressed portion and inclination. |
申请公布号 |
WO2005016820(A1) |
申请公布日期 |
2005.02.24 |
申请号 |
WO2004JP11542 |
申请日期 |
2004.08.11 |
申请人 |
TOKUYAMA CORPORATION;WAKAMATSU, SATORU;SUGIMURA, SHIGEKI;NAKAMURA, YASUO;TSUJIO, KENICHI |
发明人 |
WAKAMATSU, SATORU;SUGIMURA, SHIGEKI;NAKAMURA, YASUO;TSUJIO, KENICHI |
分类号 |
B01J19/00;B01J19/24;C01B33/02;C01B33/03 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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